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Advances in processes, masks and metrology will enable to fully benefit from the resolution gain offered by the first ASML 0.55NA EUV scanner
Imec demonstrates readiness of the High-NA EUV patterning ecosystem
This week, at the 2024 Advanced Lithography + Patterning Conference, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, will present the progress made in EUV processes, masks, and metrology prepared for enabling high-numerical aperture (High-NA) extreme ul…