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Dank der Mobilfunkverbindung ist das Weidmüller IoT Gateway 30 überall einsetzbar, unabhängig von der bestehenden Infrastruktur. / Thanks to mobile connectivity, the Weidmüller IoT Gateway 30 can be used anywhere, regardless of the existing infrastructure. Weidmüller IoT-Gateway: Der Allrounder für alle IoT-Applikationen / Weidmüller IoT Gateway: the all-rounder for all IoT applications

IoT Gateway 30 – 4G/LTE modem for flexible mobile connectivity. – Connection of IoT data and remote access. – Versatile connection through serial interfaces and protocols (Modbus RTU, TCP, OPC UA, MQTT, RFC1006...). – Integrated u-link Remote Access Servi

Weidmüller multifunction gateway

Plant automation has been undergoing rapid transformation for years. Weidmüller has always addressed and driven forward the requirements resulting from such change, with the development of smart components like IoT Gateway 30, for example. The multifunction gateway is the logical addition to the po…

28nm Pitch Single-Exposure-Strukturierung mit dem MOx-Prozess von Inpria auf einem 0,33NA EUV-Vollfeldscanner nach Ru-Metallisierung. / 28nm pitch single-exposure patterning using Inpria’s MOx process on a 0.33NA EUV full field scanner after Ru metallization. 24nm Pitch-Linien/Abstände, erzielt auf einem 0,33NA NXE:3400B Vollfeldscanner, (links) nach dem Entwickeln und (rechts) nach dem Ätzen auf der kritischen Zielgröße (CD) (uLER = unbiased line-edge roughness). / 24nm pitch line/spaces obtained on a 0.33NA NXE:3400B full field scanner, (left) after developing and (right) after etching on target critical dimension (CD) (uLER = unbiased line-edge roughness). 28nm Kontaktlöcher, erzielt mit einem 0,33NA NXE:3400 Vollfeldscanner, nach dem Entwickeln. / 28nm contact holes obtained on a 0.33NA NXE:3400 full field scanner, after developing.

Proven correlation between morphological and electrical data on 28nm pitch line/spaces increases understanding of stochastic defectivity impact on device reliability/yield

Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits

This week, at the 2021 SPIE Advanced Lithography Conference, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML, the world’s leading manufacturer of semiconductor lithography equipment, present several papers that demonstrate the ultimate single…

Auszeichnung in fünf Hauptkategorien bestätigt Vetter als verlässlichen Partner auch in herausfordernden Zeiten

Vetter schneidet auch 2021 erfolgreich bei den CMO Leadership Awards ab

- Vetter punktet mit sehr guten Bewertungen in maßgeblichen Kategorien
- Ergebnisse spiegeln positive Erfahrungen der Kunden wider
- Auszeichnung unterstreicht hohen Kundenfokus des Pharmadienstleisters

Vetter, eine global führende Contract Development und Manufacturing Organisation (CDMO), wurde auch…

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