More sustainability in semiconductor manufacturing

© Ines Escherich / Fraunhofer ENAS

Fraunhofer ENAS is part of the new project “HaloFreeEtch” (“Novel approaches for halogen-free and sustainable etching of silicon and glass”) that started in September 2024. This groundbreaking project, coordinated by the University of Technology Chemnitz, will run for 48 months with a total funding of € 3.997.735 provided by the European Union. Together with six international partners, Fraunhofer ENAS will raise the production of future semiconductors to the next level using innovative and smart etching processes.

The project “HaloFreeEtch” aims to revolutionize the semiconductor manufacturing industry by developing new, sustainable, halogen-free etching processes for silicon and silicon oxide. Traditional industrial plasma etching processes rely on halogens, which pose significant environmental and health risks. By replacing these with more sustainable alternatives, the project seeks to reduce the carbon footprint and improve the overall sustainability of semiconductor manufacturing.

With the semiconductor industry at the heart of technological innovation, developing sustainable manufacturing processes is crucial for the environment and the industry's future. The “HaloFreeEtch” project intends to position Europe at the forefront of this green transition, contributing to the global effort to reduce environmental impacts and promote sustainable practices.

Fraunhofer ENAS is taking a key role within “HaloFreeEtch” and will support the Center for Micro- and Nanotechnologies (ZfM) of University of Technology Chemnitz as project leader in a strong process engineering cooperation with its proven expertise in the development and optimization of etching processes, enabling the precise structuring of a wide variety of materials. The institute will focus in particular on developing novel methods that are not only environmentally friendly but also meet the performance requirements of modern semiconductor manufacturing. The use of hydrogen and innovative catalysts will enable the replacement of conventional halogen-based processes that pose significant environmental and health risks. Fraunhofer ENAS is thus making a valuable contribution to significantly reducing the sector’s ecological footprint.

“Our research will help redefine semiconductor technology in Europe and lead the industry into a more sustainable future,” says Dr. Karla Hiller, project leader at Fraunhofer ENAS. “We are proud to be part of this groundbreaking project and look forward to advancing the development of halogen-free etching processes.”

About the project “HaloFreeEtch”

The project will be conducted over a period of 48 months and involves several leading European research and industry partners. The results are expected to not only revolutionize semiconductor manufacturing but also enable applications in areas such as microsensors and photonics.