The achievement marks a major milestone of imec and KMLabs’ AttoLab
Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography
Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, reports for the first time the use of a 13.5 nm High Harmonic Generation source for the printing of 20nm pitch line/spaces using interference lithographic imaging of an Inpria metal-oxide resist under high…