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  • Training, Education

What is important when it comes to complying with quality standards for cleanroom products? The experts from the Cleanroom Academy provide the answers.

Key cornerstones for quality-compliant production of cleanroom products

The manufacture of mostly sensitive, highly complex and/or high-quality cleanroom products in a controlled environment that is as clean as possible, requires specific principles to ensure the desired product properties. After all, cleanroom products are subject to the most stringent requirements.

By…

Abbildung 1 – Top-down-REM-Aufnahmen von Mäandern (links) und Gabeln (rechts) mit 20 nm Abstand nach der Musterübertragung in eine TiN-Hartmaske. / Figure 1 - Top-down SEM pictures of 20nm pitch meanders (left) and forks (right) after pattern transfer into TiN hard mask. Abbildung 2 – TEM-Bild metallisierter Drähte mit 20 nm Abstand nach einem chemisch-mechanischen Poliervorgang (CMP). / Figure 2 - TEM picture of metallized 20nm pitch wires after a chemical mechanical polishing (CMP) step.
  • Electronics (wafers, semiconductors, microchips,...)

First electrical tests at 20nm pitch present a next milestone in validating the High NA extreme ultraviolet (EUV) patterning ecosystem

Imec demonstrates electrical yield for 20nm pitch metal lines obtained with High NA EUV single patterning

This week at SPIE Advanced Lithography + Patterning, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography…

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