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Die beim Wafer-Dicing mittels Laser entstandenen Schmauchreste werden mit der quattroClean-Schneestrahltechnologie anforderungsgerecht entfernt. Der Sauberkeitsnachweis erfolgte mit einem Digitalmikroskop anhand von Marken mit einem Außendurchmesser von 0,4 mm. (Bildquelle: acp systems) / The residual powder formed during wafer dicing with lasers is removed effectively by the quattroClean snow jet technology. Cleanliness was proven using a digital microscope with marks with an external diameter of 0.4 mm. (Photo credit: acp systems) Das Zusammenspiel der Wirkmechanismen der quattroClean-Schneestrahltechnologie ermöglicht, partikuläre Verunreinigungen bis in den Submikrometer-Bereich und feinste filmische Kontaminationen prozesssicher und reproduzierbar zu entfernen. (Bildquelle: acp systems) / Thanks to the interaction of the effects of the quattroClean snow jet technology, particulate contamination down to the submicrometer range as well as the finest filmic contamination is removed reliably and consistently. (Photo credit: acp systems) Die reinraumgerecht ausgelegte und ausgestattete JetStation-HP wurde für die flexible Reinigung bei höchsten Anforderungen an die Sauberkeit entwickelt. Sie wird manuell beladen und kann automatisiert oder teilautomatisiert als Standalone-Lösung betrieben werden. (Bildquelle: acp systems) / The JetStation-HP, designed and equipped for cleanroom use, was developed for flexible cleaning tasks with the highest cleanliness requirements. It is loaded manually and can be operated in partially or fully automated mode as a stand-alone solution. (Photo credit: acp systems) Die Prozessauslegung, bei der alle Prozessparameter exakt an die jeweilige Applikation, die Materialeigenschaften, die zu entfernenden Verunreinigungen sowie die geforderte Sauberkeit angepasst werden, erfolgt im Technikum der acp systems. (Bildquelle: acp systems) / The process itself, where all process parameters are precisely adapted to the respective application, material properties, contamination to be removed and cleanliness specifications, is designed in acp systems' technical center. (Photo credit: acp systems)
  • Cleaning | procedures, devices, agents, media (Wipers, Swaps,...)

CO2 snow-jet cleaning for high-purity applications

Reliable and sustainable process for cleaning high-tech components in cleanrooms

The number of parts which, due to stricter cleanliness specifications, need to be cleaned in a cleanroom is constantly rising - and this is true for many branches of industry. In most cases, these tasks cannot be solved using classic cleaning methods. Thanks to the sustainable quattroClean snow jet…

Cherwell offers expert input on contamination risk reduction and EM in line with Annex 1 at Pharmig and S2C2 events, as well as Annex 1 online resources.
  • ANNEX 1

Company offers expert input on contamination risk reduction and EM at Pharmig and S2C2 events, as well as Annex 1 online resources

Cherwell leading discussion on environmental monitoring and Annex 1

Cherwell Laboratories, specialists in cleanroom microbiology solutions for the pharmaceutical, healthcare and related industries, will be leading an open discussion on environmental monitoring (EM) in line with EU GMP Annex 1 at the forthcoming Pharmig 30th Annual Conference. The annual event to be…

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