![Montage eines High-NA EUV-Tools im gemeinsamen High-NA-Labor von imec und ASML am Hauptsitz von ASML in Veldhoven, Niederlande. (Bildnachweis: ASML) / Assembly of a High NA EUV tool in joint imec-ASML High-NA lab at ASML’s headquarters in Veldhoven, the Netherlands. (Credit: ASML) Montage eines High-NA EUV-Tools im gemeinsamen High-NA-Labor von imec und ASML am Hauptsitz von ASML in Veldhoven, Niederlande. (Bildnachweis: ASML) / Assembly of a High NA EUV tool in joint imec-ASML High-NA lab at ASML’s headquarters in Veldhoven, the Netherlands. (Credit: ASML)](/uploads/images/_scale/highnaeuvtool_169_626x352.jpg)
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Advances in processes, masks and metrology will enable to fully benefit from the resolution gain offered by the first ASML 0.55NA EUV scanner
Imec demonstrates readiness of the High-NA EUV patterning ecosystem
This week, at the 2024 Advanced Lithography + Patterning Conference, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, will present the progress made in EUV processes, masks, and metrology prepared for enabling high-numerical aperture (High-NA) extreme ul…