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![The TWINSCAN EXE:5000 High NA EUV scanner in the High NA Lab demonstrating the first-ever 10 nm dense lines obtained in a single exposure. The TWINSCAN EXE:5000 High NA EUV scanner in the High NA Lab demonstrating the first-ever 10 nm dense lines obtained in a single exposure.](/uploads/images/_scale/figurefirstexposure10nmlines_169_626x351.jpg)
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Opening of the joint ASML-imec High NA EUV Lithography Lab marks a milestone in preparing High NA EUV lithography for accelerated adoption in mass manufacturing
ASML and imec open joint High NA EUV Lithography Lab offering an early development platform to the leading-edge semiconductor ecosystem
Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML Holding N.V. (ASML), a leading lithography supplier to the semiconductor industry, today announced the opening of the High NA EUV Lithography Lab in Veldhoven, the Netherlands, a lab jointly run b…