Kalor Table Top Etcher

Table Top Etcher

Repeatability in a compact design: the fully self-contained single wafer chemical processing system handles a variety of substrates up to 8” (200mm) and is easy to install and use. The mailbox-style rectangular tank is specifically designed to minimize chemical consumption. The system uses from 2 liters for 4” (100mm) substrates up to approx. 6 liters for 8” (200mm) substrates, which can be heated, and optionally filtered and continuously re-circulated to extend chemical life.

The uniquely designed substrate holder facilitates processing of 1 up to 4 wafers at a time, only touching the wafer outer edge and can easily be adjusted to fit multiple substrate sizes.

Safety: the system is designed primarily to ensure both workplace safety and state-of-the-art process performance. All Teflon® wetted surfaces ensure compatibility with harsh chemicals and high-purity fluids.  The unit is closed by a manual lid, optionally hinged and/or water-cooled lid for fuming chemicals with extract to remove vapors safely to your facilities exhaust.

Reliability: semiconductor grade components ensure long-term reliability and performance.

The Teflon® chemical bath heater is protected by a Teflon® perforated floor grid. The unit comes complete with safety Liquid Level sensor, platinum tipped ground wire and type-J Process and Over-temperature thermocouples, as well as a process temperature high limit thermocouple. A microprocessor based Process / Temperature Controller ensures safety, process accuracy and repeatability. Chemicals can be drained safely and easily via the integrated drain valve.