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Development of the semiconductor location Itzehoe

Ausbau des Halbleiterstandortes Itzehoe
Ausbau des Halbleiterstandortes Itzehoe
The institute for Fraunhofer for silicon technology ISIT is one and of the most modern research establishments leading world-wide in the range of the micro-system technology and microelectronics. With financial support of the federal state government that is developed and modernized Fraunhofer ISIT substantial. Prime Minister Peter Harry Carstensen handed today (15 June) to the director/conductor over of the ISIT, Professor Wolfgang Benecke, in presence of numerous representatives from science, economics and politics the final promotion answer of the federal state government about 27.45 million euros for the building of a further building on the ISIT area with pure space, laboratory and office surfaces. This modern infrastructure will use the ISIT together with industrial partners, in order to develop progressive processes and elements of the micro-system technology. With the building existing bottlenecks are eliminated and new possibilities for industrial co-operation are created. The total extent of the planned investment amounts to 36.6 million euro, 9.15 million euros invests the Fraunhofer Society into this Projekt.Die planning for the development runs since 2009. In the year 2010 the building management Schleswig-Holstein (GMSH) examined the building design and approved. Also the city Itzehoe briskly gave the necessary building permits. Now the preparatory work began advertisements for building works and supplies to the building site erection plant and was immediately constantly published. The completion of the complex is intended for 2012. The heart of the new 4-st�ckigen of building is the pure space range and the laboratories later umnutzbaren as pure area in level 2. around this projectile laminates itself the additionally necessary levels. The two projectiles over the pure area serve the air conditioning: In level 4, all ventilation devices are set up to the spatial air center. In the underlying level 3 air is blown by micro-filters and led afterwards into the pure area. The level 1 which is under the pure area serves the distribution of the necessary media to the working on devices as well as the air feedback over special systems within the front range. The Basement in level 0 finally contains all technical plants necessary for the en and disposal of the pure area like the electrical center or the chemical camp. Altogether develop in the new building 1000 m � pure space and for 500 m � laboratory surfaces as well as offices for 44 coworkers. By a bridge the building is connected with the laboratory tract already existing. With the new laboratory and pure space building the existing exterior installation on the ISIT area as well as a fire-extinguishing pond put on is transformed to an attractive yard. The architects and architect for the front invented something special. It is arranged and reminded by an even raster of the structures on a silicon wafer. The large even facade components are provided with a substructure in form of punched facade components. The new solidium will present itself vis A vis the property entrance as new salient indication of the ISIT. The continuously growing demand for F& E services particularly to the ranges of topics electrical mobility and efficient handling electricity has at the ISIT in the micro-system technology, which power electronics and the energy store technology in the course of the years led to a tightness, which let the extension appear urgently necessary. Thus the equipment list in the pure area was consolidated constantly, course surfaces were converted into pure space laboratories, installed in the Basement of the old pure space building provisional laboratories and pure space ranges, converted office space in the ground floor to laboratories and rented external storage spaces for the temporary storage of devices and spare hurrying. Many coworkers had to move in office containers. With this investment the success story of the ISIT is to be updated, from which also Schleswig-Holstein profited. Into that scarcely twenty years of its existence in Itzehoe Institut developed a stable customer master of over 350 enterprises, of it about 50 from Schleswig-Holstein. 500 jobs developed locally and over 200 millions � industrial subsequent investments were so far transacted. The ISIT extension beginning now is closely connected with the modernization of the entire technology likewise begun in 2009, which is meanwhile nearly completely final. Above all new manufacturing plants were installed, those the treatment of large 200 mm of silicon crystal wafers (wafer) make instead of the 150 mm used up to then through-measuring wafer possible. The ISIT ordered with this technology platform over one also internationally regards the most modern F& E mechanisms and is thus very well set up for further successful co-operation with enterprises and institutions in the area of the micro and nano-system engineering. The meaning of the development beginning now for Institut underlines ISIT leader professor Wolfgang Benecke: " The new technological possibilities will lead to further bilateral industrial projects and too publicly promoted projects. For the ISIT good chances for a further occupation buildup in Itzehoe result over the ISIT extension hinaus." Picture: Model opinion of the planned new laboratory, office and pure space building with the Fraunhofer ISIT. Idea givers for the facade design are structures on a silicon wafer.

This text was translated automatically.


Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
80686 München
Germany


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